CASE STUDIES

Nano-Imprint Tool

Situation

Semiconductor OEM was looking to create fully custom EFEM to align Wafers and Masks

Problem

Off the shelve solution did not exist for the handling of multiple substrates. Sub-micron level requirements drove active vibration isolation and precise stages

ODI Role

Owens Design delivered a custom design and complete system that meet the requirements for handling (wafers and masks), cleanliness and precision alignment requirements.

  • Custom load ports (based on existing ODI designs)
  • Custom end effectors and aligner for mask and wafers
  • Active vibration isolation and submicron accurate stage
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Nano-Imprint Tool