Nano-Imprint Tool


Semiconductor OEM was looking to create fully custom EFEM to align Wafers and Masks


Off the shelve solution did not exist for the handling of multiple substrates. Sub-micron level requirements drove active vibration isolation and precise stages

ODI Role

Owens Design delivered a custom design and complete system that meet the requirements for handling (wafers and masks), cleanliness and precision alignment requirements.

  • Custom load ports (based on existing ODI designs)
  • Custom end effectors and aligner for mask and wafers
  • Active vibration isolation and submicron accurate stage
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Nano-Imprint Tool